Handbook of cleaning for semiconductor manufacturing : fundamentals and applications /
This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physic...
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| Other Authors: | |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Salem, Mass. ; Scrivener ; Hoboken, N.J. :
John Wiley & Sons, Inc.,
©2011.
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| Series: | Wiley-Scrivener.
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| Subjects: | |
| Online Access: | CONNECT |
| Summary: | This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This. |
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| Item Description: | Wiley EBA |
| Physical Description: | 1 online resource (xxii, 590 pages) : illustrations |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9781118071748 9781613441770 1613441770 9781118071731 1118071735 0470625953 1118071743 9780470625958 1118099516 9781118099513 1283374595 9781283374590 9786613374592 6613374598 |
