Electromigration in thin films and electronic devices : materials and reliability /
Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part on...
Saved in:
Other Authors: | |
---|---|
Format: | eBook |
Language: | English |
Published: |
Oxford :
Woodhead Pub.,
2011.
|
Series: | Woodhead Publishing in materials.
|
Subjects: | |
Online Access: | CONNECT CONNECT |