Electromigration in thin films and electronic devices : materials and reliability /

Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part on...

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Bibliographic Details
Other Authors: Kim, Choong-Un.
Format: eBook
Language:English
Published: Oxford : Woodhead Pub., 2011.
Series:Woodhead Publishing in materials.
Subjects:
Online Access:CONNECT
CONNECT